Two Step Charge and Chamber Purge Upgrade
- Ideally suited for non-proof test applications
- Provides a two step low pressure and high-pressure helium charge that will allow quick identification of large product leaks preventing helium contamination of the chamber
- Chamber purge provides an enhanced gas flow technique used to flush residual helium from the chamber and sample line after gross or fine leaks – allows immediate unaffected testing of subsequent cycles
- On-site installation available